Contribution of Ion Energy and Flux on High-Aspect Ratio SiO2 Etching Characteristics in a Dual-Frequency Capacitively Coupled Ar/C4F8 Plasma: Individual Ion Energy and Flux Controlled

Analysis of the transmission spectrum of the microwave cutoff probe influenced by the sheath around the probe

On the Quenching of Electron Temperature in Inductively Coupled Plasma

Determination of Plasma Potential Using an Emissive Probe with Floating Potential Method

Real-time monitoring of the plasma density distribution in low-pressure plasmas using a flat-cutoff array sensor

Development of the Tele-Measurement of Plasma Uniformity via Surface Wave Information (TUSI) Probe for Non-Invasive In-Situ Monitoring of Electron Density Uniformity in Plasma Display Fabrication Process

Analysis on crossing frequency in transmission microwave frequency spectrum of the cutoff probe

Computational Analysis on Self-Resonance Frequency of Solenoid and Planar Inductor

Effect of mixing CF4 with O-2 on electron characteristics of capacitively coupled plasma

Investigation into SiO2 Etching Characteristics Using Fluorocarbon Capacitively Coupled Plasmas: Etching with Radical/Ion Flux-Controlled